- Theaccusedhasmadeadeposition.Helivedapoorlifeafterhisdeposition.Hemakesadepositionthathehavewitnesstheaccident.Thedepositionoffatmaybegeneralorlocal.Aswithanytestimonyordeposition,beingdirectwillbekeyforSchmidt.DustdepositionratesarehighestintheMiddl...
- 10190
- Bytheexperimentofsandmodel,aninvestigationofsiltcontent,rankofsiltgrainandsiltdepositionrateunderdifferentconditionsofwaterandsilthavebeenobtained.Inthedesignofsandbasin,thefirstproblemistoselectthecalculationmethodofsuspendedsiltdepositionrate.Centu...
- 20944
- Thesilicainducesafibrogenicresponsebymacrophagestoproducethenodularfociofcollagendeposition.Thealveolitisthatproducesfibroblastproliferationandcollagendepositionisprogressiveovertime.Thistrichromestainofthestomachdemonstratesintensebluestaininginthes...
- 31499
- Anepitaxialdepositionprocessincludingadryetchprocess,followedbyanepitaxialdepositionprocessisdisclosed.Theprincipleofionassisteddepositiontechnologyinthevacuumdepositionprocessisdiscussed.Theprincipleofthequartzcrystaldepositionmonitortechnologyinthe...
- 20164
- Becauseofthedepositiontimeandthedegreeofsilicificationofdifferentbeddingstructureverydifferentform,Qiancengstonetojadeancientdepositionalage.Becauseofthedifferentofthedepositiontimeandthedegreeofsilicification,thebeddingstructureformeddifferent,depos...
- 17407
- StudyonionreleaseofNifromdentalNiCralloybyplasmamagnetronreactivesputterdepositionVacuumsputterdepositiontechniquesweredevelopedtoachievehighHc,withhighMsmaterialsepitaxiallygrownonCrunderlayers.Onthebasisofthesummarizationofnanofilmmaterialpreparati...
- 26975
- chemicalvapordepositionreactorplasmachemicalvapordepositionmodifiedchemicalvapordepositionmetalloorganicchemicalvapordepositionlaserinductionchemicalvapordepositionmethodMicrocrystallinesiliconthinfilmspreparedatdifferentdepositionparametersusingvery...
- 27255
- PreparingaluminumnitridethinfilmbyatomiclayerdepositionThescientistsusedaprocesscalledatomiclayerdepositiontocoatsomespidersilkwithzinc,titaniumoraluminum....
- 12771
- ThedepositionrateofAlfilmdecreaseswiththeincreaseofthesubstratetemperature.Thedepositionrateincreaseswiththeincreasingofbiasvoltagepressure.Effectsofcompositioninsolutionandprocessconditionsondepositionratewerestudied.However,thedepositionrateofAlfil...
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- 1、chemicalvapordepositionreactor2、plasmachemicalvapordeposition3、photochemicalvapordepositionoxide4、modifiedchemicalvapordeposition5、metalloorganicchemicalvapordeposition6、laserinductionchemicalvapordepositionmethod7、Uses:sputteringtarget,phys...
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