- CharacteristicsofHfO_xN_ythinfilmsbyrfreactivesputteringatdifferentdepositiontemperaturesEffectofTechnologicalparametersondepositionrateofZAOfilmspreparedbyDCmagnetronreactivesputteringInvestigationofmechanicalpropertiesofZrCNthinfilmsfabricatedbyDCm...
- 15155
- Thehighersputteringyieldwouldresultfrommultiplecollision,lateralsputteringandhighdensityenergydepositionofgasclusterionbeam.Thesputteringyieldperclusterionishigherthanthatformonomerionbyafactorofmorethan100.Whentheincidentenergyishigherthanthethresho...
- 14975
- Developmentofhigh-powerpulsemagnetronsputteringtechnologyTheapplicationofthin-filmsputteringtechnologyindownholeTOR&WOBmeasurement...
- 14946
- 1、DielectricbreakdownofBSTthinfilmspreparedbyRFsputteringisstudiedinthispaper.2、InfluenceofRFsputteringpoweranddopedhydrogenonthestructureofSi∶Hfilms...
- 27378
- 1、ionsputteringcoater2、Withincreasingsputteringpressure,thetransmittanceincreases.3、PreparationofSiO_2ionbarrierfilmwithRFmagnetronsputtering4、N-dopedzincoxidethinfilmsbyrfmagnetronsputtering5、Anewmultiplehollowcathodesputteringtargetwhichhasasi...
- 8574